Introduction:

① Vacuum: 2.0x10-8Pa;

② Material: 316L stainless steel;

③ Interface flange: All CF blade flanges;

④ Surface treatment: degreasing electrolytic polishing treatment;

⑤ Chamber size: customized according to user needs.

Introduction to MBE molecular beam epitaxy equipment:

Molecular beam epitaxy (MBE) is a newly developed epitaxial film deposition method and a special vacuum coating process. Epitaxy is a new technology for preparing single crystal thin films, which is a method of growing thin films layer by layer along the crystal axis direction of the substrate material under appropriate substrate and conditions.

The advantages of this technology are: low substrate temperature, slow film growth rate, easy and accurate control of beam intensity, and rapid adjustment of film composition and doping concentration with changes in the source. This technology has been used to prepare single crystal thin films as thin as dozens of atomic layers, as well as ultra-thin quantum microstructure materials formed by alternately growing thin films of different compositions and doping.