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Olympus upright metallographic microscope
The Olympus BX3M series microscope adopts a modular design, providing diverse solutions for a wide range of materials science and industrial applicati
Product details
Manual switch for rotating electric objective lens converter manual controller Exposure button


A system designed specifically for image analysis

Recoverable microscope settings: encoding hardware

BX3M has adopted a new encoding feature that integrates the hardware settings of the microscope with the Olympus Stream image analysis software. The observation method, illumination intensity, and objective position are all recorded in the software and/or manual controller. The encoding function enables automatic saving of microscope settings along with each image, making it easy to complete subsequent restoration settings and provide document records for reports. Not only does it save the operator's time, but it also greatly reduces the probability of using incorrect settings. The current observation settings are always clearly displayed on the manual controller and software.

Operation steps Operation A Operation B
Different operators use different settings
Easy to verify correct settings
Keep observation settings synchronized
Although the operators are different, the settings are the same

Functions for various inspection and analysis tasks

MIX observation: turning unseen into visible

BX3M's MIX observation technology combines bright and dark field illumination methods. The LED light source in the MIX illumination slider illuminates the sample with directional dark field light. This method is similar to traditional dark field lighting, but it can also provide a quadrant selection function for LED lighting at different angles. This combination of directional dark field, bright field, fluorescence, or polarization is called MIX illumination, which helps to highlight display defects and distinguish between raised and recessed surfaces.

traditional

The bright field directly illuminates the sample with light, while the dark field illuminates the sample from the side along the periphery of the objective lens, highlighting scratches and defects.

advanced

MIX observation is a combination of bright field, fluorescence, polarization, and directional dark field formed by a circular LED light source. You can adjust the LED light source and choose which direction to illuminate from. This method can obtain unique contrast and highlight surface features on surfaces that cannot be observed by traditional methods.

Instant MIA: Easily move the stage for panoramic shooting

Instant MIA: Easily move the stage for panoramic shooting

Now there is no need for an electric stage, simply move the XY knob on the manual stage to easily and quickly stitch images. The Olympus Stream software uses pattern recognition technology to generate panoramic images, providing users with a wider field of view than a single image.

Real time MIA image of a coin.

EFI: Creating Super Depth of Field Images

The depth of field extended imaging (EFI) function of Olympus Stream software can capture sample images with a height exceeding the depth of focus of the objective lens, overlay the images through different focal planes, and create a super depth of field image. EFI can be performed using manual or electric Z-axis mechanisms, and a height map can be created to easily identify sample structures. You can also create EFI images offline using Stream desktop version.

HDR: Capture details of both high and low light areas simultaneously

High Dynamic Range (HDR) utilizes advanced image processing techniques to adjust for brightness differences within an image, thereby reducing glare. HDR improves the visual effect of digital images, providing users with professional images when creating reports.


With the help of HDR function, the details of both highlight and dark areas are presented clearly
(Sample: Fuel Injector)

Enhanced contrast with HDR function
(Sample: Magnesium Slice)

Adjustable to meet the preference requirements for observation and analysis

The selection range of observation methods is wide

Reflected light microscopes are applied in various industries. The following are just some examples of effects obtained through different observation methods, such as bright field (BF), dark field (DF), differential interference difference (DIC), polarization (PL), fluorescence (FL), infrared (IR), and transmitted light (TL).

DF (Example: Surface Mount Substrate) DIC (Example: Corrosion Testing of Ductile Iron) PL (Example: Sericite)
FL (Example: Particle foreign matter on semiconductor wafer) IR (Example: Electrode Slicing) TL (Example: LCD color filter)

Conventional or basic measurement functions

Multiple measurement functions can be achieved through Olympus Stream software, allowing users to easily obtain useful data from images. It is often necessary to measure images during quality control and inspection. All levels of Olympus Stream licensed software include interactive measurement functions such as distance, angle, rectangle, circle, ellipse, and polygon. All measurement results are saved together with the image file for future file retrieval.

Counting and Measurement

Target detection and size distribution measurement are important applications in digital imaging. Stream software uses threshold segmentation methods for object detection, which can reliably separate targets (such as particles and scratches) from the background.

Material Solutions

Olympus Stream software provides an intuitive workflow based interface that can be used for complex image analysis. Click the button to quickly and accurately perform complex image analysis tasks, and comply with commonly used industry standards. Due to the significant reduction in processing time for repetitive tasks, materials scientists can focus on analysis and research. It is also possible to easily add modular plugins for comparing inclusions and standard rating charts at any time.


Long history of optical technology

Excellent optical performance: wavefront aberration control

When using a microscope for research or system integration, the optical performance of all objectives must be standardized. Olympus' UIS2 objective provides wavefront aberration control, greatly reducing aberrations that can reduce resolution, thereby achieving numerical aperture (NA) and working distance (WD) performance indicators.

Stable color temperature and high-intensity white LED lighting

BX3M provides high-intensity white LED light sources for both reflected and transmitted light illumination. Regardless of the intensity, LEDs maintain a consistent color temperature. LED provides excellent and long-lasting lighting, making it an ideal tool for materials science testing applications.


High and low light intensity obtained through halogen lamps High and low light intensity obtained through LED

High quality for advanced performance

Support measurement: automatic calibration

Similar to digital microscopes, automatic calibration can also be implemented when using Olympus Stream software. Automatic calibration eliminates human factors during the calibration process and can obtain more reliable measurement results. The automatic calibration algorithm uses the average of multiple measurement points to automatically calculate the correct calibration amount. This greatly reduces the differences generated by different operators, maintains consistent accuracy, and improves the reliability of regular verification.


Seamless stitching: Image shadow correction

Shadow correction can be achieved using Olympus Stream software to compensate for shadows around corners of the image. When setting the light intensity threshold, shadow correction provides more accurate analysis. In addition, when using MIA to stitch images, a more uniform panoramic image can be obtained.

1 x 3 MIA image (example: residue on thin film filter)

Left image: During image stitching, there is a shadow at the stitching point of the original image
Right image: After shadow correction, the entire field of view is illuminated uniformly

Configuration legend for materials science and industrial applications

BBX53M Reflection and Reflection/Transmission Light Combination

The BX3M series has two types of microscope frames, one for reflecting light only and one for combining reflected and transmitted light. Both types of racks can be configured with manual, coded, or electric components. The rack is equipped with ESD anti-static function to protect electronic samples.


BX53MRF-S configuration legend BX53MTRF-S configuration legend BX53MIR observation

IR objective lenses can be used for imaging through silicon materials for semiconductor inspection and measurement. Equipped with 5x to 100x infrared (IR) objective lenses, providing aberration correction from visible light wavelengths to near-infrared. For high magnification observations, rotating the correction ring of the LCPLN-IR series can correct aberrations caused by sample thickness. Clear images can be obtained using a single objective lens.

BX53M Polarization Combination

The BX53M polarizing microscope can achieve high contrast polarized imaging and is an ideal choice for geologists. For example, various studies such as mineral identification, analysis of crystal optical properties, and identification of rock thin sections all benefit from stable microscope and optical systems.


BX53-P Positive Mirror Inspection Configuration BX53-P Conical Mirror Inspection/Positive Mirror Inspection Configuration

Burgundy mirror used for cone light microscopy and positive image microscopy

Using the U-CPA cone light observation attachment makes the switch between cone light microscopy and positive image microscopy simple and fast. Can clearly focus on the interference pattern of the focal plane after focusing. The field of view aperture of the Burgundy mirror enables it to consistently capture sharp and clear cone light images.

A wide variety of color supplements and wavelength plates

Six different color supplements are provided for measuring birefringence of rocks and mineral thin sections. The horizontal range of optical path difference measurement is from 0 to 20 λ. For more convenient measurement and high image contrast, Berek and Senarmont color complements can be used, which can change the optical path difference level throughout the entire field of view.

Measurement range of complementary colorimeter

*R=optical path difference level

For most accurate measurements, it is recommended to use complementary color filters (except U-CWE2) in combination with interference filters 45-IF546.

Stress free optical components

The UPLFLN-P stress free objective lens benefits from Olympus' design and manufacturing technology, which reduces internal stress to extremely low levels. This means a higher EF value, which can result in excellent image contrast.

BXFM system

BXFM is suitable for special applications or integrated into other instruments. The modular structure, combined with various special small lighting fixtures and fixed devices, allows it to be directly used in unique environments and configurations.

Modular design, build your own system

Microscope frame

Two types of microscope frames can be used for reflecting light; One also has the ability to observe transmitted light. At the same time, it is equipped with an adapter to lift the lighting fixture and adapt to higher samples.

bracket

If the sample is not suitable for placement on the stage during microscopic examination, an illumination device and optical components can be installed on a larger bracket or other equipment.

Lens barrel

When using an eyepiece for microscope imaging or observing through a camera, please select the lens barrel based on the type of imaging and the operator's observation posture during the observation process.

Illuminator

The lighting fixture projects light onto the sample based on the selected observation method. The software is used in conjunction with a coded lighting fixture to read the position of the beam splitter component and automatically identify the observation method.

light source

Please select the appropriate light source and power supply for sample illumination based on the observation method.

Nosepiece

Accessories for objective lens and slider. Select the required number and type of objective lenses; And whether it comes with a slider attachment.

slider

Select the DIC slider to supplement conventional bright field observations. After using a DIC slider, high contrast or high-resolution types can be selected when obtaining three-dimensional morphology information about the sample. MIX lighting is very flexible to use, providing segmented LED light sources in the dark field path.

Control box and manual controller

The control box is used to combine microscope hardware and PC, and the manual controller is used for hardware status display and control.

stage

The stage and platform used for placing samples. Select based on the shape and size of the sample.

Camera adapter

Adapter for photographic observation. You can choose from the required field of view and magnification. The actual observation range can be calculated using the following formula:
Actual field of view (diagonal mm)=field of view (number of fields of view) ÷ objective magnification.

eyepiece

An eyepiece used for direct observation of microscopes. Choose based on the desired field of view.

Filter

Optical color filters can perform various types of conversions on the light shining on the sample. Choose the appropriate color filter based on observation needs.

condenser

A spotlight can converge and focus transmitted light. Used for observing transmitted light.

Spectroscope component

Spectroscope component for BX3M-URAS-S. Choose based on the required observations.

Middle tube

Various types of attachments for multiple purposes. Used between the lens barrel and the lighting fixture.

More information

1

U-CA

Transformer (1x, 1.25x, 1.6x, 2x)

2

U-ECA

Transformer (1x, 2x)

3

U-EPA2

Eye point adjuster:+30 mm

4

U-DP

Double port tube for U-DP1XC

5

U-DP1xC

C-interface TV camera adapter for U-DP

6

U-TRU

Three eyed middle tube

UIS2 objective lens

The objective lens can magnify the sample. Choose an objective lens that matches the working distance, resolution, and observation method used.


BX53MTRF-S

BX53MRF-S

BXFM

Optical system

UIS2 optical system (infinite correction)

Microscope frame

Lighting

Reflection/Transmission

Reflection

Focusing

Travel distance: 25 mm
Fine tuning stroke per revolution: 100 μ m
Minimum scale: 1 μ m
Equipped with an upper limit limiter for torque adjustment of the coarse adjustment handle

Travel distance: 30 mm
Fine tuning stroke per revolution: 200 μ m
Minimum scale: 2 μ m
Equipped with torque adjustment for rough adjustment handle

Sample height online

35 mm (excluding height adapter)
75 mm (with BX3M-ARMAD)

65 mm (excluding height adapter)
105 mm (with BX3M-ARMAD)

Depends on installation configuration

Observation tube

Wide field of view FN22

Inverted images: binocular, trinocular, tilted binocular
Just like: three eyes, tilted binocular

Ultra wide field of view FN26.5

Inverted image: Three eyes
Just like: three eyes, tilted three eyes

Reflected light illumination

Conventional observation techniques

BX3M-RLAS-S
Encoding, white LED, BF/DF/DIC/POL/MIX FS, AS (with centering device)
BX3M-KMA-S
White LED, BF/DIC/POL/MIX FS, AS (with centering device)
BX3M-RLA-S
100W halogen lamp, white LED, BF/DF/DIC/POL/MIX FS, AS (with centering device)
Mid density color filter linkage during BF/DF switching

-

U-KMAS
White LED, 100W halogen lamp
Fiber optic lighting, BF/DIC/POL/MIX

Fluorescence

BX3M-URAS-S
Encoding, 100W mercury lamp, 4-hole spectroscope component converter, (standard: WB, WG, WU+BF, etc.)
FS, AS (with centering device), with optical shutter device

Transmitted light

White LED
Abbe/long working distance spotlight

-

Objective lens converter

Used for BF

Six holes, centering six holes, seven holes, encoding five holes (optional electric objective lens converter)

Used for BF/DF

Six holes, five holes, centering five holes, encoding five holes (optional electric objective lens converter)

Carrier platform

Coaxial left-hand (right-hand) operation of the stage:
76mm × 52mm, with torque adjustment
Large coaxial left-handed (right-handed) operating stage:
100mm × 105mm, with Y-axis locking device
Large coaxial right-handed operating stage:
150mm x 100mm, with torque adjustment and Y-axis locking device

-

Weight

Approximately 18.3 kg
(Microscope frame 7.6 kg)

Approximately 15.8 kg
(Microscope frame 7.4 kg)

Approximately 11.1 kg
(Microscope frame 1.9 kg)

Olympus BX53M series microscope standard configuration parameters

BX53 specification (for polarized observation)



BX53MTRF-S

Polarized intermediate attachment
(U-CPA or U-OPA)

Wide field of view FN22

Inverted images: binocular, trinocular, tilted binocular
Just like: three eyes, tilted binocular

Bo's mirror

Focusing (applicable only to U-CPA)

Bo's field of view aperture

Diameter Ø 3.4mm (fixed) (applicable only to U-CPA)

When switching between positive and cone light microscopy, add or remove the Burgers scope

Slide position ● Enter
Slide position ○ Exit
(Applicable only to U-CPA)

Polarizing mirror slot

Rotating polarizer slot (U-AN360P-2)

Polarizer (U-AN360P-2)

360 ° rotatable dial
Extremely small rotatable angle of 0.1 °

Chinese Objective Lens Converter (U-P4RE)

Four holes, with centering device: 1/4 λ polarizer (U-TAD)
The test board (U-TP530) and various color correction devices can be connected to a color correction adapter (U-TAD) for use.

Loading Platform (U-SRP)

Polarized specialized rotating carrier with 3-point centering function
Can rotate 360 °, can be locked in any position, 360 ° increments by 1 ° per quarter
(Zui small resolution 6 ', using a vernier caliper)
45 ° locking function
Adjustable Mobile Specimen Holder (U-FMP)

Spotlight (U-POC-2)

Anti chromatic aberration stress free spotlight (U-POC-2), a rotatable 360 ° polarizer with an external swing anti chromatic aberration top lens.
The locking mechanism at the "0 °" scale is adjustable.
NA0.9 (Top Lens Inner Swing)
NA0.18 (top lens outward swing)
Aperture stop: adjustable diameter from 2mm to 21mm

Weight

Approximately 16.2 kg (microscope frame 7.6 kg)

BX53M/BXFMESDdevice

Components

Microscope frame: BX53MRF-S, BX53MTRF-S
Illuminator: BX3M-KMA-S, BX3M-RLA-S, BX3M-URAS-S, BX3M-RLAS-S
Objective lens converter: U-D6BDRES-S, U-D6RE-ESD, U-D5BDREMC-ESD, U-5RES-ESD
Stage: U-SIC4R2, U-SIC4L2, U-MSSP4

Olympus uprightmetallurgical microscopeBX53M series photo rendering:


5X奥林巴斯暗场 5X奥林巴斯明场
5X Olympus Darkfield 5X Olympus Mingchang
10X奥林巴斯暗场 10X奥林巴斯明场
10X Olympus Darkfield 10X Olympus Mingchang
20X奥林巴斯暗场 20X奥林巴斯明场
20X Olympus Darkfield 20X Olympus Mingchang
50X奥林巴斯暗场 50X奥林巴斯明场
50X Olympus Darkfield 50X Olympus Mingchang
d6e83407-3426-4c73-b5ac-6964ffe040db1.jpg 2e55849d-0068-4fdb-af44-efebfbc13cf2.jpg
100X Olympus Darkfield 100X Olympus Mingchang
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